Title: Study of CVD high-k gate oxides on high-mobility Ge and Ge/Si substrates
Authors: Van Elshocht, Sven
Caymax, Matty
Conard, Thierry
De Gendt, Stefan
Hoflijk, Ilse
Houssa, Michel
Leys, Frederik
Bonzom, Renaud
De Jaeger, Brice
Van Steenbergen, Jan
Vandervorst, Wilfried
Heyns, Marc
Meuris, Marc
Issue Date: 2005
Conference: 4th International Conference on Silicon Epitaxy and Heterostructures - ICSI-4 location:Leuven Belgium date:23/05/05
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous
Molecular Design and Synthesis

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