Title: Characteristics and integration of selectively grown strain-relaxed SiGe buffer layers
Authors: Caymax, Matty
Delhougne, Romain
Loo, Roger
Eneman, Geert
Verheyen, Peter
Issue Date: 2005
Conference: 1st International Workshop on New Group IV Semiconductor Nanoelectronics location:Leuven Belgium date:27/05/05
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems

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