|ITEM METADATA RECORD
|Title: ||Characteristics and integration of selectively grown strain-relaxed SiGe buffer layers|
|Authors: ||Caymax, Matty|
|Issue Date: ||2005 |
|Conference: ||1st International Workshop on New Group IV Semiconductor Nanoelectronics location:Leuven Belgium date:27/05/05|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
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