Title: Influence of processing conditions on CoSi2 formation in the presence of a Ti capping layer
Authors: Detavernier, C ×
van Meirhaeghe, R.L
Vandervorst, Wilfried
Maex, Karen #
Issue Date: 2004
Series Title: Microelectronic Engineering vol:71 issue:03/04/07 pages:252-261
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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