Title: Comparative growth kinetics of SiGe in a commercial reduced pressure chemical vapour deposition EPI reactor and anomalies during growth of thin Si layers on SiGe
Authors: Caymax, Matty ×
Loo, Roger
Brijs, Bert
Vandervorst, Wilfried
Howard, Dave
Kimura, K
Nakajima, K #
Issue Date: 1998
Host Document: pages:339-344
Conference: Epitaxy and Applications of Si-Based Heterostructures; location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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