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Title: Electromigration-induced drift in damascene vs. conventional interconnects: an intrinsic difference
Authors: Proost, Joris ×
Samajdar, I
Witvrouw, Ann
Maex, Karen #
Issue Date: 1998
Host Document: MRS Proceedings vol:516 pages:89-94
Conference: Materials Reliability in Microelectronics VIII; MRS Spring Meeting. location:San Francisco, USA date:Apr 13-16 1998
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

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