|ITEM METADATA RECORD
|Title: ||In-line electrical metrology for high-k gate dielectrics deposited by atomic layer chemical vapour deposition|
|Authors: ||De Witte, H ×|
Heyns, Marc #
|Issue Date: ||Sep-2002 |
|Publisher: ||ICG Publishing Ltd|
|Series Title: ||Semiconductor Fabtech issue:17 pages:111-115|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Non-KU Leuven Association publications|
× corresponding author|
# (joint) last author|
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