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Semiconductors for Room-Temperature Radiation Detector Applications II;, Date: 1997/12/01 - 1997/12/05, Location: MA, BOSTON

Publication date: 1998-01-01
Volume: 487 Pages: 387 - 92
ISSN: 1-55899-392-4
Publisher: Cambridge University Press

SEMICONDUCTORS FOR ROOM-TEMPERATURE RADIATION DETECTOR APPLICATIONS II

Author:

Ohyama, Hidenori
Hakata, T ; Simoen, Eddy ; Claeys, Cor ; Takami, Y ; Kawamura, K ; Miyahara, K ; Hosashima, M ; James, RB ; Schlesinger, TE ; Siffert, P ; Dusi, W ; Squillante, MR ; OConnell, M ; Cuzin, M

Keywords:

Science & Technology, Technology, Engineering, Electrical & Electronic, Materials Science, Multidisciplinary, Nuclear Science & Technology, Engineering, Materials Science

Abstract:

Results are presented for the first time of a study on the degradation of the electrical performance of MOSFET's processed on SIMOX substrates and subjected to a 220-MeV carbon irradiation. For the n-MOSFETs an unstable increase of the drain current in linear operation is found, while for the p-MOSFETs, a drastic reduction is observed, both in linear operation and in saturation. The radiation damage is also compared to the results for 1-MeV electrons, 1-MeV fast neutrons and 20-MeV alpha rays. The differences in the damage coefficients are explained by the differences in the number of knock-on atoms and the nonionizing energy loss (NIEL). The recovery behavior of the device performance by isochronal annealing is also reported.