Title: ALD HfO2 surface preparation study
Authors: Delabie, Annelies
Caymax, Matty
Maes, J
Bajolet, Philippe
Brijs, Bert
Cartier, Eduard
Conard, Thierry
De Gendt, Stefan
Richard, Olivier
Vandervorst, Wilfried
Zhao, Chao
Green, Martin
Tsai, Wilman
Heyns, Marc #
Issue Date: 2002
Publisher: MRS
Conference: MRS Fall Meeting Symposium N: Novel Materials and Processes for Advanced CMOS location:Leuven Belgium date:02/12/02
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
# (joint) last author

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