Title: Materials issues of Ni fully silicided (FUSI) gates for CMOS applications
Authors: Kittl, Jorge
Lauwers, Anne
Kmieciak, Malgorzata
Demeurisse, Caroline
Kottantharayil, Anil
Veloso, Anabela
Van Dal, Mark
Schram, Tom
Brijs, Bert
Kaiser, M
Kubicek, Stefan
Cunniffe, John
Verbeeck, Rita
Vrancken, Christa
Biesemans, Serge
Maex, Karen #
Issue Date: May-2005
Publisher: ECS
Conference: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment location:Quebec, Canada date:16/05/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
# (joint) last author

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