Title: Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applications
Authors: Van Dal, Mark ×
Lauwers, Anne
Cunniffe, John
Verbeeck, Rita
Vrancken, Christa
Demeurisse, Caroline
Dao, T
Tamminga, Y
Veloso, Anabela
Kittl, Jorge
Maex, Karen #
Issue Date: May-2005
Publisher: ECS
Conference: Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment location:Quebec, Canada date:16/05/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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