|ITEM METADATA RECORD
|Title: ||Self-aligned PtSi fully silicided (FUSI) metal gates for 45 nm CMOS applications|
|Authors: ||Van Dal, Mark ×|
Maex, Karen #
|Issue Date: ||May-2005 |
|Conference: ||Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS: New Materials, Processes, and Equipment location:Quebec, Canada date:16/05/05|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
× corresponding author|
# (joint) last author|
|Files in This Item:
There are no files associated with this item.
Request a copy
All items in Lirias are protected by copyright, with all rights reserved.