Title: Prospect of Hf-based gate dielectric by PVD with FUSI gate for LSTP application
Authors: Niwa, Masaaki ×
Mitsuhashi, Riichirou
Yamamoto, Kazuhiko
Hayashi, S
Harada, Y
Kubota, M
Rothschild, Aude
Hoffmann, Thomas Y
Kubicek, Stefan
De Gendt, Stefan
Heyns, Marc
Biesemans, Serge #
Issue Date: 2005
Publisher: The Electrochemical Society
Host Document: ECS Transactions vol:1 issue:5 pages:516
Conference: ECS Meetings edition:208th location:Los Angeles date:16-21 October
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Molecular Design and Synthesis
× corresponding author
# (joint) last author

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