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Title: Compatibility of polysilicon with HfO2-based gate dielectrics for CMOS applications
Authors: Kaushik, V ×
De Gendt, Stefan
Caymax, Matty
Young, E
Röhr, Erika
Van Elshocht, Sven
Delabie, Annelies
Claes, Martine
Shi, Xiaoping
Chen, Jerry
Carter, Richard
Conard, Thierry
Vandervorst, Wilfried
Schaekers, Marc
Heyns, Marc #
Issue Date: 2003
Publisher: Electrochemical Society
Host Document: pages:391-396
Conference: ULSI Process Integration III location:Austin, TX USA date:28/04/03
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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