Title: Lithographic process simulation for scanners
Authors: Op de Beeck, Maaike ×
Vandenberghe, Geert
Jaenen, Patrick
Zhang, Fenghong
Delvaux, Christie
Richardson, Paul
Van Puyenbroeck, Ilse
Ronse, Kurt
Lamb, J. E
van der Hilst, J. B. C
van Wingerden, Johannes #
Issue Date: 1998
Host Document: pages:322-36
Conference: Optical Microlithography XI; 25-27 February 1998; Santa Clara, CA, USA. location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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