This item still needs to be validated !
Title: Growth and physical properties of MOCVD-deposited hafnium oxide films and their properties on silicon
Authors: Van Elshocht, Sven
Caymax, Matty
De Gendt, Stefan
Conard, Thierry
Petry, Jasmine
Claes, Martine
Witters, Thomas
Zhao, Chao
Brijs, Bert
Richard, Olivier
Bender, Hugo
Vandervorst, Wilfried
Carter, Richard
Kluth, J
Daté, L
Pique, D
Heyns, Marc
Issue Date: 2002
Conference: MRS Fall Meeting Symposium N: Novel Materials and Processes for Advanced CMOS location:Leuven Belgium date:02/12/02
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Electrical Engineering - miscellaneous

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.