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|ITEM METADATA RECORD
|Title: ||Continued scalability of copper/low-k interconnects|
|Authors: ||Brongersma, Sywert|
De Ceuninck, Ward
|Issue Date: ||2005 |
|Conference: ||MRS Spring Symposium B: Materials, Technology, and Reliability of Advanced Interconnects location:San Francisco, CA, USA date:28/03/05|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Electrical Engineering - miscellaneous|
Associated Section of ESAT - INSYS, Integrated Systems
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