Title: Reduction of plasma process induced damage during gate poly etching by using the SiO2 hard maks
Authors: Lee, Hean-Cheal ×
Creusen, Martin
Groeseneken, Guido
Vanhaelemeersch, Serge #
Issue Date: 1998
Host Document: pages:72-5
Conference: Proceedings of the 3rd International Symposium on Plasma-Induced Damage (P2ID); location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science