This item still needs to be validated !
ITEM METADATA RECORD
Title: Local mechanical stress induced during Ti- and Co/Ti silicidation reaction in sub-0.25 ?m MOS technologies
Authors: Steegen, An
De Wolf, Ingrid
Bender, Hugo
Maex, Karen
Issue Date: 1998
Conference: Workshop on Nanoscale Characterization of Silicide/Semiconductor Contacts by Scanning Probe Microscopy; 24 Sept. 1998; Gent, Bel
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
Electrical Engineering - miscellaneous

Files in This Item:

There are no files associated with this item.

Request a copy

 




All items in Lirias are protected by copyright, with all rights reserved.