This item still needs to be validated !
Title: Process and properties of ALD tungsten nitride carbide barrier films for interconnects
Authors: Schuhmacher, Jörg
Tokei, Zsolt
Beyer, Gerald
Li, Yunlong
Stokhof, Maarten
Schaekers, Marc
Maex, Karen
Issue Date: 2003
Conference: Advanced Metallization Conference location:Montreal, Canada date:21/10/03
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems

Files in This Item:

There are no files associated with this item.


All items in Lirias are protected by copyright, with all rights reserved.