Title: Process optimization and integration of trimethylsilane-deposited a-SiC:H and a-SiCO:H dielectric thin films for damascene processing
Authors: Gray, W.D ×
Loboda, M.J
Bremmer, J.N
Struyf, Herbert
Lepage, Muriel
Van Hove, Marleen
Alves Donaton, Ricardo
Sleeckx, Erik
Stucchi, Michele
Lanckmans, Filip
Gao, Teng
Boullart, Werner
Coenegrachts, Bart
Maenhoudt, Mireille
Vanhaelemeersch, Serge
Meynen, H
Maex, Karen #
Issue Date: 2003
Series Title: Journal of the Electrochemical Society vol:150 issue:7 pages:G404-G411
ISSN: 0013-4651
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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