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Title: Electromigration behaviour of 0.3 µm damascene vs. plasma-etched interconnects: a lifetime and drift analysis
Authors: Proost, Joris ×
Li, H
Brijs, Bert
Witvrouw, Ann
Maex, Karen #
Issue Date: 1998
Host Document: Proc. IITC pages:110-112
Conference: Proceedings of the IEEE 1998 International Interconnect Technology Conference; 1-3 June 1998; San Francisco, CA, USA. location:San Francisco, USA date:Jun 1-3, 1998
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
Department of Materials Engineering - miscellaneous
× corresponding author
# (joint) last author

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