Title: Thermal budget limitations when integrating a low-k hydrogen silsesquioxane interconnect technology
Authors: Waeterloos, Joost ×
Maex, Karen #
Issue Date: 1998
Host Document: pages:343-345
Conference: Proceedings Advanced Metallization and Interconnect Systems for ULSI Applications in 1997;
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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