Title: Lateral solvent diffusion characterization of low k dielectric plasma damage and ALD barrier film closure
Authors: Abell, Thomas ×
Schuhmacher, Jorg
Tokei, Zsolt
Travaly, Youssef
Maex, Karen #
Issue Date: 2005
Series Title: Microelectronic Engineering vol:82 issue:03/04/07 pages:411-415
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science