Title: N2 as carrier gas: an alternative to H2 for enhanced epitaxy of Si, SiGe and SiGe:C
Authors: Meunier-Beillard, Philippe ×
Caymax, Matty
Van Nieuwenhuysen, Kris
Doumen, Geert
Brijs, Bert
Hopstaken, M
Geenen, Luc
Vandervorst, Wilfried #
Issue Date: 2003
Host Document: pages:121-122
Conference: Abstracts Book ISTDM - 1st International SiGe Technology and Device Meeting location:Leuven Belgium date:15/01/03
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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