Title: Thin SiGe strain-relaxed buffer layers: relaxation mechanism and integration in strained Si MOS-FETs
Authors: Caymax, Matty
Delhougne, Romain
Loo, Roger
Eneman, Geert
Verheyen, Peter
Ries, Michael
Luysberg, Martina
Issue Date: 2005
Conference: Institute of Thin Films and Interfaces location:Leuven Belgium date:28/06/05
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems

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