Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic., Location: Leuven Belgium
Publication date:
2003-01-01
Pages:
215 -
226
Proc. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic.
Author:
Duhayon, Natasja
Eyben, Pierre ; Fouchier, Marc ; Clarysse, Trudo ; Vandervorst, Wilfried ; Alvarez, David ; Schoemann, S ; Ciappa, M ; Stangoni, M ; Fichtner, W ; Formanek, P ; Raineri, V ; Giannazzo, F ; Goghero, D ; Rosenwaks, Y ; Shikler, R ; Saraf, S ; Sadewasser, S ; Barreau, N ; Glatzel, T ; Verheijen, M ; Mentink, SAM ; von Sprekelsen, M ; Maltezopoulos, T ; Wiesendanger, R ; Hellemans, Louis