Title: Threshold voltage instability in CMOS high-K dielectrics: comparison between hafnium and aluminum oxide
Authors: Cimino, S
Pantisano, Luigi
Pacagnella, A
Groeseneken, Guido
Issue Date: 2003
Conference: 34th IEEE Semiconductor Interface Specialists Conference - SISC location:Padova Italy date:04/12/03
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Electrical Engineering - miscellaneous
ESAT - MICAS, Microelectronics and Sensors

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.