Title: Influence of gate length on ESD performance for deep submicron CMOS technology
Authors: Bock, Karlheinz ×
Keppens, Bart
Groeseneken, Guido
Ching, L. Y
Naem, Abdalla #
Issue Date: 1999
Host Document: pages:95-104
Conference: Electrical Overstress/Electrostatic Discharge Symposium Proceedings.; Sept. 1999; Orlando, FL, USA. location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

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