Title: Physical characterization of thin HfO2 layers by the combined analysis with complementary techniques
Authors: Bender, Hugo ×
Conard, Thierry
Richard, Olivier
Brijs, Bert
Petry, Jasmine
Vandervorst, Wilfried
Defranoux, C
Boher, P
Rochat, N
Wyon, C
Mack, P
Wolstenholme, J
Vitchev, R
Houssiau, L
Pireaux, J.J
Bergmaier, A
Dollinger, G #
Issue Date: 2003
Publisher: Electrochemical Society
Host Document: pages:223-232
Conference: Analytical Techniques for Semiconductor Materials and Processes location:Leuven Belgium date:27/04/03
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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