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Title: TaN metal gate MOSFETs with agressively scaled HfO2 dielectrics
Authors: Lander, Rob ×
Schram, Tom
Lujan, Guilherme
Hooker, Jacob
Vertommen, Johan
Lee, S
Deweerd, Wim
Boullart, Werner
Van Elshocht, Sven
Carter, Richard
Kubicek, Stefan
De Meyer, Christina
De Gendt, Stefan
Heyns, Marc #
Issue Date: 2003
Publisher: ECS
Host Document: pages:367-374
Conference: Advanced Short-Time Thermal Processing for Si-based CMOS devices location:Leuven Belgium date:27/04/03
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Surface and Interface Engineered Materials
× corresponding author
# (joint) last author

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