Title: The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface
Authors: Kim, Young-Chang
Baklanov, Mikhaïl
Conard, Thierry
Vanhaelemeersch, Serge
Vandervorst, Wilfried
Issue Date: 1998
Conference: 4th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98); 21-23 September 1998; Oostende, Belgium.
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous

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