|ITEM METADATA RECORD
|Title: ||The optimization of the cleaning process to remove residual bonds of SiC and Si-F after fluorocarbon plasma etch on the silicon surface|
|Authors: ||Kim, Young-Chang|
|Issue Date: ||1998 |
|Conference: ||4th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98); 21-23 September 1998; Oostende, Belgium.|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Electrical Engineering - miscellaneous|
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