Title: Angle resolved XPS characterization of the formation of Cl and Br bonds in poly-silicon etching and its cleaning
Authors: Kim, Young-Chang
Beckx, Stephan
Vanhaelemeersch, Serge
Vandervorst, Wilfried
Issue Date: 1998
Conference: 4th International Symposium on Ultra Clean Processing of Silicon Surfaces (UCPSS '98); 21-23 September 1998; Oostende, Belgium.
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous

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