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Title: Electromigration threshold in damascene versus plasma-etched interconnects
Authors: Proost, Joris ×
Maex, Karen
Delaey, Lucas #
Issue Date: 1998
Series Title: Appl. Phys.Lett. vol:73 issue:19 pages:2748-2750
ISSN: 0003-6951
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Department of Materials Engineering - miscellaneous
Physical Metallurgy and Materials Engineering Section (-)
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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