Title: Precursor penetration and sealing of porous CVD SiCOH low k dielectric for atomic layer deposition of WCxNy
Authors: Abell, Thomas ×
Shamiryan, Denis
Schuhmacher, Jörg
Besling, W
Sutcliffe, V
Maex, Karen #
Issue Date: 2003
Publisher: MRS
Host Document: pages:717-723
Conference: Proceedings of the Advanced Metallization Conference 2002 location:Leuven Belgium date:01/10/02
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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