Title: Sub nanometer depth resolution profiling of the evolution and annealing of damage and the dopant redistribution of ultra-shallow As and Sb implants in Si
Authors: Van den Berg, J.A ×
Werner, M
Armour, D.G
Vandervorst, Wilfried
Clarysse, Trudo
Collart, E.H.J
Goldberg, R.D
Bailey, P
Noakes, T.C #
Issue Date: 2003
Host Document: pages:446
Conference: Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic. location:Salford UK date:27/04/03
Publication status: published
KU Leuven publication type: IMa
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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