|ITEM METADATA RECORD
|Title: ||Sub nanometer depth resolution profiling of the evolution and annealing of damage and the dopant redistribution of ultra-shallow As and Sb implants in Si|
|Authors: ||Van den Berg, J.A ×|
Noakes, T.C #
|Issue Date: ||2003 |
|Host Document: ||pages:446|
|Conference: ||Ultra Shallow Junctions. 7th Int. Worksh. Fabrication, Characterization and Modeling of Ultra Shallow Doping Profiles in Semic. location:Salford UK date:27/04/03|
|Publication status: ||published|
|KU Leuven publication type: ||IMa|
|Appears in Collections:||Electrical Engineering - miscellaneous|
× corresponding author|
# (joint) last author|
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