Title: Current status and addressing the challenges of Hf-based gate stack toward 45nm-LSTP application
Authors: Niwa, Masaaki ×
Mitsuhashi, Riichirou
Yamamoto, K
Hayashi, S
Harada, Yoshinao
Rothschild, Aude
Hoffmann, Thomas Y
Kubicek, Stefan
De Gendt, Stefan
Heyns, Marc
Biesemans, Serge
Kubota, M #
Issue Date: Oct-2005
Publisher: Jap. Soc. of Applied Phys.
Host Document: pages:6-7
Conference: Extended Abstracts of the International Conference on Solid State Devices and Materials - SSDM location:Leuven Belgium date:13/09/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Molecular Design and Synthesis
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.