Title: The need to incorporate the real micro-contact distribution in spreading resistance correction schemes
Authors: Clarysse, Trudo ×
Vandervorst, Wilfried #
Issue Date: 1999
Host Document: pages:105-116
Conference: 5th International Workshop on the Measurement, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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