|ITEM METADATA RECORD
|Title: ||The need to incorporate the real micro-contact distribution in spreading resistance correction schemes|
|Authors: ||Clarysse, Trudo ×|
Vandervorst, Wilfried #
|Issue Date: ||1999 |
|Host Document: ||pages:105-116|
|Conference: ||5th International Workshop on the Measurement, Characterization, and Modeling of Ultra-Shallow Doping Profiles in Semiconductors location:Leuven Belgium|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Electrical Engineering - miscellaneous|
× corresponding author|
# (joint) last author|
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