Title: Influence of pre and post process conditions on the composition of thin Si3Ni4 thin films (3nm) studied by XPS and TOFSIMS
Authors: Conard, Thierry
De Witte, Hilde
Vandervorst, Wilfried
Houssa, Michel
Heyns, Marc
Pomarede, C
Werkhoven, Chris
Issue Date: 1999
Conference: Materials Research Society Fall Meeting; October 1999; Boston, MA, USA. location:Leuven Belgium
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Electrical Engineering - miscellaneous
Semiconductor Physics Section

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