|ITEM METADATA RECORD
|Title: ||Influence of pre and post process conditions on the composition of thin Si3Ni4 thin films (3nm) studied by XPS and TOFSIMS|
|Authors: ||Conard, Thierry|
De Witte, Hilde
|Issue Date: ||1999 |
|Conference: ||Materials Research Society Fall Meeting; October 1999; Boston, MA, USA. location:Leuven Belgium|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Electrical Engineering - miscellaneous|
Semiconductor Physics Section
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