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Title: CMOS integration of dual work function phase controlled Ni FUSI with simultaneous integration of nMOS (NiSi) and pMOS (Ni-rich silicide) gates on HfSiON
Authors: Lauwers, Anne ×
Veloso, Anabela
Hoffmann, Thomas Y
Van Dal, Mark
Vrancken, Christa
Brus, Stephan
Locorotondo, Sabrina
de Marneffe, Jean-Francois
Sijmus, Bram
Kubicek, Stefan
Chiarella, Thomas
Kmieciak, Malgorzata
Opsomer, Karl
Niwa, Masaaki
Mitsuhashi, Riichirou
Kottantharayil, Anil
Yu, HongYu
Demeurisse, Caroline
Verbeeck, Rita
de Potter de ten Broeck, Muriel
Absil, Philippe
Maex, Karen
Jurczak, Malgorzata
Biesemans, Serge
Kittl, Jorge #
Issue Date: Dec-2005
Publisher: IEEE
Host Document: pages:661-664
Conference: Technical Digest International Electron Devices Meeting - IEDM location:Leuven Belgium date:05/12/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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