This item still needs to be validated !
Title: Resistivity of ultra-narrow Cu interconnects fabricated with ion beam lithography
Authors: Wu, Wen ×
Jonckheere, Rik
Tokei, Zsolt
Stucchi, Michele
Struyf, Herbert
Vos, Ingrid
Bender, Hugo
Maex, Karen #
Issue Date: 2003
Publisher: MRS
Host Document: pages:345-348
Conference: Proceedings of the Advanced Metallization Conference 2002 location:Leuven Belgium date:01/10/02
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.