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Title: Resistivity of ultra-narrow Cu interconnects fabricated with ion beam lithography
Authors: Wu, Wen ×
Jonckheere, Rik
Tokei, Zsolt
Stucchi, Michele
Struyf, Herbert
Vos, Ingrid
Bender, Hugo
Maex, Karen #
Issue Date: 2003
Publisher: MRS
Host Document: pages:345-348
Conference: Proceedings of the Advanced Metallization Conference 2002 location:Leuven Belgium date:01/10/02
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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