|ITEM METADATA RECORD
|Title: ||Copper seed layer scaling for advanced interconnects: extendibility of I-PVD|
|Authors: ||Tokei, Zsolt ×|
Maex, Karen #
|Issue Date: ||2003 |
|Host Document: ||pages:403-407|
|Conference: ||Proceedings of the Advanced Metallization Conference 2002 location:Leuven Belgium date:01/10/02|
|Publication status: ||published|
|KU Leuven publication type: ||IC|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
× corresponding author|
# (joint) last author|
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