|ITEM METADATA RECORD
|Title: ||Nanoscale post-breakdown conduction of HfO2/SiO2 MOS gate stacks studied by enhanced-CAFM|
|Authors: ||Blasco, X ×|
Vandervorst, Wilfried #
|Issue Date: ||Dec-2005 |
|Series Title: ||IEEE Transactions on Electron Devices vol:52 issue:12 pages:2817-2819|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Electrical Engineering - miscellaneous|
× corresponding author|
# (joint) last author|
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