Title: Nanoscale post-breakdown conduction of HfO2/SiO2 MOS gate stacks studied by enhanced-CAFM
Authors: Blasco, X ×
Nafria, M
Aymerich, X
Petry, Jasmine
Vandervorst, Wilfried #
Issue Date: Dec-2005
Series Title: IEEE Transactions on Electron Devices vol:52 issue:12 pages:2817-2819
ISSN: 0018-9383
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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