Title: Process optimization of low temperature silicon nitride stressor layers for improvement of device performance for 45nm technology and below
Authors: Eyckens, Brenda
Collaert, Nadine
Schaekers, Marc
Sleeckx, Erik
Eneman, Geert
Verheyen, Peter
Rooyackers, Rita
Issue Date: 2005
Conference: 8th Technical and Scientific Meeting of CREMSI 8th Technical and Scientific Meeting of CREMSI location:Leuven Belgium date:20/10/05
Publication status: published
KU Leuven publication type: DI
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems

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