|ITEM METADATA RECORD
|Title: ||Process optimization of low temperature silicon nitride stressor layers for improvement of device performance for 45nm technology and below|
|Authors: ||Eyckens, Brenda|
|Issue Date: ||2005 |
|Conference: ||8th Technical and Scientific Meeting of CREMSI 8th Technical and Scientific Meeting of CREMSI location:Leuven Belgium date:20/10/05|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Associated Section of ESAT - INSYS, Integrated Systems|
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