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Title: Characteristics of Selective Epitaxial SiGe and Si Deposition processes for recessed source/drain applications
Authors: Loo, Roger ×
Verheyen, Peter
Eneman, Geert
Rooyackers, Rita
Leys, Frederik
Shamiryan, Denis
De Meyer, Christina
Absil, Philippe
Caymax, Matty #
Issue Date: 2005
Conference: ASM Users Meeting location:Leuven Belgium date:29/09/05
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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