Title: Temperature acceleration of oxide breakdown and its impact on ultra-thin gate oxide reliability
Authors: Degraeve, Robin ×
Pangon, Nadège
Kaczer, Ben
Nigam, Tanya
Groeseneken, Guido
Naem, Abdalla #
Issue Date: 1999
Host Document: pages:59-60
Conference: Symposium on VLSI Technology: Technical Digest; June 1999; Kyoto, Japan. location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
ESAT - MICAS, Microelectronics and Sensors
× corresponding author
# (joint) last author

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