Title: The influence of Ti capping layers on CoSi2 formation in the presence of interfacial oxide
Authors: Detavernier, C ×
Donaton, R. A
Maex, Karen
Jin, S
Bender, Hugo
Van Meirhaeghe, R
Cardon, F #
Issue Date: 1999
Host Document: pages:139-144
Conference: Advanced Interconnects and Contacts; MRS Spring Meeting 1999; April 1999; San Francisco, CA, USA.
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

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