|ITEM METADATA RECORD
|Title: ||Metastable and stable transistion-metal silicide layer formation in Si and SiGe|
|Authors: ||Dézsi, I|
|Issue Date: ||1999 |
|Conference: ||International Conference on the Application of the Mössbauer Effect; August 1999; Garmisch-Partenkirchen.|
|Publication status: ||published|
|KU Leuven publication type: ||DI|
|Appears in Collections:||Nuclear and Radiation Physics Section|
|Files in This Item:
There are no files associated with this item.
Request a copy
All items in Lirias are protected by copyright, with all rights reserved.