Title: Effect of N2 anneal on thin HfO2 layers studied by C-AFM
Authors: Petry, Jasmine ×
Vandervorst, Wilfried
Blasco, X #
Issue Date: Apr-2004
Series Title: Microelectronic Engineering vol:72 issue:1-4 pages:174-179
ISSN: 0167-9317
Publication status: published
KU Leuven publication type: IT
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.

© Web of science