|ITEM METADATA RECORD
|Title: ||Effect of N2 anneal on thin HfO2 layers studied by C-AFM|
|Authors: ||Petry, Jasmine ×|
Blasco, X #
|Issue Date: ||Apr-2004 |
|Series Title: ||Microelectronic Engineering vol:72 issue:1-4 pages:174-179|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Electrical Engineering - miscellaneous|
× corresponding author|
# (joint) last author|
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