Title: Integration of non-etchback low-k methy silsequioxane polymer using electron beam cure
Authors: Gao, Teng ×
Coenegrachts, Bart
Waeterloos, Joost
Van Hove, Marleen
Maex, Karen
Yang, Jiping
Wang, Sharon
Forester, Lynn #
Issue Date: 1999
Host Document: pages:491-497
Conference: Advanced Metallization Conference in 1998. Proceedings of the Conference; location:Leuven Belgium
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author
# (joint) last author

Files in This Item:

There are no files associated with this item.

Request a copy


All items in Lirias are protected by copyright, with all rights reserved.