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Title: High-k materials for advanced gate stack dielectrics: a comparison of ALCVD and MOCVD as deposition technologies
Authors: Caymax, Matty ×
Bender, Hugo
Brijs, Bert
Conard, Thierry
De Gendt, Stefan
Delabie, Annelies
Heyns, Marc
Onsia, Bart
Ragnarsson, Lars-Ake
Richard, Olivier
Vandervorst, Wilfried
Van Elshocht, Sven
Zhao, Chao
Maes, J.W
Daté, L
Pique, D
Young, E
Tsai, W
Shimamoto, Y #
Issue Date: 2003
Publisher: MRS
Host Document: pages:47-58
Conference: CMOS Front-End Materials and Process Technology location:Leuven Belgium date:21/04/03
Publication status: published
KU Leuven publication type: IC
Appears in Collections:Electrical Engineering - miscellaneous
× corresponding author
# (joint) last author

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