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|ITEM METADATA RECORD
|Title: ||Effect of oxide and W-CMP on the material properties and electromigration behaviour of layered aluminium metallizations|
|Authors: ||Heyvaert, Ilse ×|
Van Hove, Marleen
Bender, Hugo #
|Issue Date: ||2000 |
|Series Title: ||Microelectronic Engineering vol:50 issue:1-4 pages:291-299|
|Conference: ||European Workshop Materials for Advanced Metallization; March 8-10, 1999; Oostende, Belgium. location:Leuven Belgium date:07-10 March 1999|
|Publication status: ||published|
|KU Leuven publication type: ||IT|
|Appears in Collections:||Mechanical Metallurgy Section (-)|
Associated Section of ESAT - INSYS, Integrated Systems
× corresponding author|
# (joint) last author|
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